Numerical Simulation of the Relation between Plasma Reflection and Keyhole Dimension in the Keyhole PAW Process

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Abstract:

A three-dimensional mathematical model has been established to research the relation between the plasma reflection and status of keyhole during the keyhole PAW processing. It has been found that the strength of the plasma reflection is related to the keyhole dimension. Another condition to make the plasma refection appearance is that the keyhole or concave in the pool must be unsymmetrical about the axis of the plasma arc. The mechanism of detecting circuit designed based on the fact that the plasma refection is able to indicate the status of keyhole is mathematically studied. The result shows that the voltage signal in the detecting circuit can be used to indicate the status of keyhole.

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Periodical:

Advanced Materials Research (Volumes 399-401)

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1812-1815

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November 2011

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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