Study on a New Method to Produce NiTi Thin Film

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Abstract:

A new method to prepare NiTi thin film with two separate targets is presented. In this technology, two pure Ni target and pure Ti target are fixed and the substrate is rotating. The final thin film structure is analyzed by Scanning Electron Microscope. Results show that there is no layer structure in the film; the sputtering power and the substrate temperature have great influence to the morphology of the film; all the grain pattern are column under different technological parameters.

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Advanced Materials Research (Volumes 415-417)

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1899-1902

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December 2011

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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