Influence of Technical Parameters on the Residual Stress in the Diamond Coating

Hong Xiang Wang; Dun Wen Zuo; Chun Xu; Chun Zhou

doi:10.4028/www.scientific.net/AMR.426.85

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Influence of Technical Parameters on the Residual Stress in the Diamond Coating

Abstract:

The diamond coatings were prepared by hot filament chemical vapor deposition(HFCVD) on the mono-crystalline silicon substrates. The influence of the technical parameters such as methane volume ratio, substrate temperature and reaction pressure on the residual stress in the diamond coating was studied. The results showed that the residual stress in the coating was compressive stress in the range of parameters studied, and too high or too low substrate temperature, chamber pressure and methane volume ratio would all increase the residual compressive stress. This relationship can be explained by the influence of amorphous carbon content, vacancy density and grain size on the residual stress.