Preparation of Silica Nano-Rods by CVD

Abstract:

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The straight silica nano-rods with a diameter of about 200nm and smooth surface were synthesized by chemical vapor deposition method at 1300°C. The as-synthesized samples were characterized by means of scanning electron microscopy, energy dispersive x-ray, and transmission electron microscopy. The results show that as-synthesized silica nano-rods have a uniform size, well-defined shape, and smooth surface. However, the morphologies and microstructures of silica nano-rods are affected by synthesis conditions, such as the concentration of the SiOx and the the deposition temperature. On the basis of these experimental results, a possible growth mechanism of silica nano-rods in this process is proposed.

Info:

Periodical:

Advanced Materials Research (Volumes 47-50)

Edited by:

Alan K.T. Lau, J. Lu, Vijay K. Varadan, F.K. Chang, J.P. Tu and P.M. Lam

Pages:

359-362

DOI:

10.4028/www.scientific.net/AMR.47-50.359

Citation:

G. Zhu et al., "Preparation of Silica Nano-Rods by CVD", Advanced Materials Research, Vols. 47-50, pp. 359-362, 2008

Online since:

June 2008

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Price:

$35.00

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