Preparation of Silica Nano-Rods by CVD
The straight silica nano-rods with a diameter of about 200nm and smooth surface were synthesized by chemical vapor deposition method at 1300°C. The as-synthesized samples were characterized by means of scanning electron microscopy, energy dispersive x-ray, and transmission electron microscopy. The results show that as-synthesized silica nano-rods have a uniform size, well-defined shape, and smooth surface. However, the morphologies and microstructures of silica nano-rods are affected by synthesis conditions, such as the concentration of the SiOx and the the deposition temperature. On the basis of these experimental results, a possible growth mechanism of silica nano-rods in this process is proposed.
Alan K.T. Lau, J. Lu, Vijay K. Varadan, F.K. Chang, J.P. Tu and P.M. Lam
G. Zhu et al., "Preparation of Silica Nano-Rods by CVD", Advanced Materials Research, Vols. 47-50, pp. 359-362, 2008