Synthesis of Si3N4/Polyimide Hybrid Films

Abstract:

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Si3N4/polyimide hybrid films based on 4,4-oxydianiline (ODA) and pyromellitic dianhydride(PMDA) were prepared by incorporation with different content of nano-sized Si3N4. In this study, the effect of Si3N4 on the microstructure of the Si3N4/polyimide film was characterized by Fourier Transform Infrared Spectrometry (FTIR), scanning electron microscope (SEM). The dependence of mechanical properties and thermal stability of the Si3N4/polyimide film were also investigated. The hardness from unload of the Si3N4/polyimide film were expressly investigated for the first time.

Info:

Periodical:

Advanced Materials Research (Volumes 47-50)

Edited by:

Alan K.T. Lau, J. Lu, Vijay K. Varadan, F.K. Chang, J.P. Tu and P.M. Lam

Pages:

984-986

DOI:

10.4028/www.scientific.net/AMR.47-50.984

Citation:

Y. Q. Wen et al., "Synthesis of Si3N4/Polyimide Hybrid Films", Advanced Materials Research, Vols. 47-50, pp. 984-986, 2008

Online since:

June 2008

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Price:

$35.00

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