Synthesis of Si3N4/Polyimide Hybrid Films
Si3N4/polyimide hybrid films based on 4,4-oxydianiline (ODA) and pyromellitic dianhydride(PMDA) were prepared by incorporation with different content of nano-sized Si3N4. In this study, the effect of Si3N4 on the microstructure of the Si3N4/polyimide film was characterized by Fourier Transform Infrared Spectrometry (FTIR), scanning electron microscope (SEM). The dependence of mechanical properties and thermal stability of the Si3N4/polyimide film were also investigated. The hardness from unload of the Si3N4/polyimide film were expressly investigated for the first time.
Alan K.T. Lau, J. Lu, Vijay K. Varadan, F.K. Chang, J.P. Tu and P.M. Lam
Y. Q. Wen et al., "Synthesis of Si3N4/Polyimide Hybrid Films", Advanced Materials Research, Vols. 47-50, pp. 984-986, 2008