Synthesis of Si3N4/Polyimide Hybrid Films
Si3N4/polyimide hybrid films based on 4,4-oxydianiline (ODA) and pyromellitic dianhydride(PMDA) were prepared by incorporation with different content of nano-sized Si3N4. In this study, the effect of Si3N4 on the microstructure of the Si3N4/polyimide film was characterized by Fourier Transform Infrared Spectrometry (FTIR), scanning electron microscope (SEM). The dependence of mechanical properties and thermal stability of the Si3N4/polyimide film were also investigated. The hardness from unload of the Si3N4/polyimide film were expressly investigated for the first time.
Prof. Alan Kin Tak Lau, Dr. J. Lu, Vijay K. Varadan, Fu-Kuo Chang, J.P. Tu and Pou Man Lam
Y. Q. Wen et al., "Synthesis of Si3N4/Polyimide Hybrid Films", Advanced Materials Research, Vols. 47-50, pp. 984-986, 2008