Atomic Diffusion of Al and Si in Cu_44.25Ag_14.75Zr₃₆Ti₅ Bulk Metallic Glass

Abstract:

Secondary ion mass spectroscopy (SIMS) has been adopted to study the diffusion of Al and Si in Cu_44.25Ag_14.75Zr₃₆Ti₅ bulk metallic glass (BMG). It has been found that around the transition temperature of metallic glass, the relation between its diffusion coefficient and the temperature satisfy the same Arrhenius relation, which means the metallic transition has not caused change to the diffusion mechanism. In addition, the radius of Al atom is close to that of Si atom, but under the same temperature and time condition, the diffusion coefficient of Si atom in bulk metallic glass (BMG) is twice that of the Al atom, while there is not a big difference in diffusion activation energy. This is because as non-metallic element, the radius of Si atom has a strong binding force with the metal atoms in the base material, which also has a bigger diffusion coefficient.

• Periodical: Advanced Materials Research (Volume 510)
• Pages: 804-807
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.510.804
• Online since: April 2012
• Authors: Wei Yuan Yu, You Liang Wang, Wen Jiang Lu
• Keywords: Bulk Metallic Glass (BMG), Diffusion Mechanism, Secondary Ion Mass Spectroscopy (SIMS)

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