Formation of a Low Reflective Surface on Silicon Solar Cells by Chemical Treatment Using Ag-Assisted Electroless Etching

Guo Feng Ma; Hong Ling Zhang; Xue Fei Yang

doi:10.4028/www.scientific.net/AMR.512-515.43

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 512-515Formation of a Low Reflective Surface on Silicon...

Formation of a Low Reflective Surface on Silicon Solar Cells by Chemical Treatment Using Ag-Assisted Electroless Etching

Abstract:

The Ag-assisted electroless etching of p-type silicon substrate in HF/H₂O₂ solution at room temperature was investigated. The porous silicon layer was formed in a mixed solution of H₂O₂ and HF by using screen-printed Ag front electrodes as the catalyst. And influence of the different concentration etching solution (HF and AgNO₃) on the porous silicon layer was study by scanning electron microscopy (SEM). Through investigation of the track of catalyst particles, it was shown that Ag really catalyses the etching of silicon underneath Ag particle.

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Periodical:

Advanced Materials Research (Volumes 512-515)

Pages:

43-46

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.512-515.43

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Online since:

May 2012

Authors:

Guo Feng Ma, Hong Ling Zhang, Xue Fei Yang

Keywords:

Ag, Catalyst, Porous Silicon Layer, P-Type Silicon

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