Research on the Relationship between the Spray Overlap Width and the Photoresist Film Thickness and Uniformity

De Gang Qu; Dong Xiang; Peng Mou; Han Wang; Ying Li Gong; Nan Liu

doi:10.4028/www.scientific.net/AMR.535-537.1308

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 535-537Research on the Relationship between the Spray...

Research on the Relationship between the Spray Overlap Width and the Photoresist Film Thickness and Uniformity

Abstract:

Because of its small average droplet size, low carrier gas flow rate and the droplets not easy to splash etc, the ultrasonic atomizing spray technology is particularly suitable for making photoresist films. In order to get a reasonable spray scan interval, the parabolic deposition model was used to study the relationship between the spray overlap width and the photoresist film thickness and uniformity, and it can be concluded that the thickness of the film increases and the thickness variance of the film decreases oscillatorily along with the increasing of the spray overlap width.To obtain good uniformity of the photoresist film, the dimensionless overlap width should be at least greater than 0.15.

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Periodical:

Advanced Materials Research (Volumes 535-537)

Pages:

1308-1313

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.535-537.1308

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Online since:

June 2012

Authors:

De Gang Qu, Dong Xiang, Peng Mou, Han Wang, Ying Li Gong, Nan Liu

Keywords:

Film Thickness, Parabolic Model, Spray Overlap Width, Thickness Variance

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