Preparation of Lead Zirconate Titanate Thin Film Using Magnetron Sputtering

Li Yang Yu; Yang Wang; Guo Hua Yao

doi:10.4028/www.scientific.net/AMR.538-541.162

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 538-541Preparation of Lead Zirconate Titanate Thin Film...

Preparation of Lead Zirconate Titanate Thin Film Using Magnetron Sputtering

Abstract:

PZT(lead zirconate titanate) piezoelectric thin films were deposited on the glass substrates by RF (radio frequency) magnetron sputtering reaction method. The XRD(X-ray diffraction) analysis is used to characterize the structure of thin film, the pattern of EDS(energy dispersive spectrometer) shows the composition of thin film, and SEM(Scanning Electron Microscopy) is used to study the morphologies of thin films. The influence of different sputter gas content on the crystalline quality and the surface morphology are also investigated. The results demonstrate that volatile of lead oxide is closed to the ratio with the oxide content. The roughness of the thin film is influenced by the crystalline quality.

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Periodical:

Advanced Materials Research (Volumes 538-541)

Pages:

162-165

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.538-541.162

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Online since:

June 2012

Authors:

Li Yang Yu, Yang Wang, Guo Hua Yao

Keywords:

Lead Zirconate Titanate, Magnetron Sputtering, Thin Film

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