Microstructure Characterization of the Reaction Interface between CBN Grain and Titanium-Deposited Film

Wen Feng Ding; Yang Min Liang; Jian He; Li Tang; Jie Yu; Zhi Wu Liu

doi:10.4028/www.scientific.net/AMR.538-541.166

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 538-541Microstructure Characterization of the Reaction...

Microstructure Characterization of the Reaction Interface between CBN Grain and Titanium-Deposited Film

Abstract:

Cubic boron nitride (CBN) abrasive grains with surface titanium-deposited film were heat-treated during 550-950°C for 60 min under high vacuum circumstance. Detailed interfacial compounds analysis by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersion spectrometer (EDS), differential thermal analysis (DTA) indicates that the interfacial reactions are much dependent on the heating temperature to some extents, and the reaction products, TiN, TiB2 and TiB chiefly form the network structure. In particular, at 950°C the transition layers with excellent performance, CBN/TiB2/TiB/(TiB+TiN)/TiN/CBN, is realized.