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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 567The Study of SiC Substrate MgB2 thick Films...

The Study of SiC Substrate MgB₂thick Films Growing along C Axis

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Abstract:

We have fabricated MgB2 thick films on SiC substrates growing along c axis by using hybrid physical–chemical vapor deposition (HPCVD) technique. The thickness was 8μm. Electric measurement showed that the Tc (onset) was 41.4K, and the transition width was 0.5K, the residual resistance ratio (RRR) was near 7. Magnetic measurement showed that the critical current density was 1.7×106A/cm2 at 5K in a self field.

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Periodical:

Advanced Materials Research (Volume 567)

Pages:

153-157

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.567.153

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Online since:

September 2012

Authors:

Yin Bo Wang, Sheng Meng, Qian Dai, Zhang Yan, Qing Rong Feng

Keywords:

HPCVD, MgB₂, Superconducting Thick Film

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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