As(III) and As(V) Removal on Manganese Dioxide

Shu Qiong Kong; Yan Xin Wang; Xiao Wu Huang; Cheng Wang

doi:10.4028/www.scientific.net/AMR.573-574.39

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 573-574As(III) and As(V) Removal on Manganese Dioxide

As(III) and As(V) Removal on Manganese Dioxide

Abstract:

Experiments were performed to investigate the As(III) and As(Ⅴ) removal on manganese dioxide. 0.5 grams of manganese dioxide was reacted at room temperature for 3 hours with 50 mL As(III) or As(V) in synthesized groundwater. Throughout the reaction, concentration of arsenic decreased from 1.25 mg/L to 0.70 mg/L in As(Ⅴ) system, arsenic removal was about 44.27%. While in As(III) system, concentration of total arsenic decreased from 1.92 mg/L to 0.85 mg/L, arsenic removal was about 55.85%. When As(III) reacted with manganese dioxide, the concentration of As(Ⅴ) in solution reached the maximum value for the oxidation of As(III) after 45min, afterwards As(Ⅴ) decreased slowly for adsorption on manganese dioxide. In regard to total manganese concentration, it was 1.25 mg/L in As(III) system, was about 1.25 times of that from As(Ⅴ) system, this phenomenon was due to the redox of As(III) with manganese dioxide.

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Periodical:

Advanced Materials Research (Volumes 573-574)

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39-42

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https://doi.org/10.4028/www.scientific.net/AMR.573-574.39

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Online since:

October 2012

Authors:

Shu Qiong Kong, Yan Xin Wang, Xiao Wu Huang, Cheng Wang

Keywords:

Adsorption, Arsenic, Manganese Dioxide, Oxidation, Removal

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