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Target to Substrate Distance Dependent Optical and Electrical Properties of Sputtered NiO Films

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Abstract:

Nickel oxide (NiO) thin films were deposited on glass substrates at various target to substrate distances in the range of 60 to 80 mm by dc reactive magnetron sputtering technique. It was observed that target to substrate distance influenced the morphological, optical and electrical properties of the deposited films. The optical results revealed that the optical transmittance of the films increased with increasing the target to substrate distance upto 70 mm, thereafter it was decreased. The increase in transmittance of the films was due to an increase in size of the grains. The NiO films exhibited an optical transmittance of 60 % and direct band gap of 3.82 eV at target to substrate distance of 70 mm. The films showed high electrical resistivity of 37.3 Ωcm at target to substrate distance of 60 mm and low electrical resistivity of 5.1 Ωcm at target to substrate distance of 70 mm. At high target to substrate distance of 80 mm the electrical resistivity of the film was increased.

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Periodical:

Advanced Materials Research (Volume 584)

Pages:

33-36

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.584.33

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Online since:

October 2012

Authors:

Avula Mallikarjuna Reddy, Akepati Sivasankar Reddy, Pamanji Sreedhara Reddy

Keywords:

Electrical Properties, Optical Property, Sputtering, Target-to-Substrate Distance

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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