Investigation of Vanadium Oxide Thin Film Deposited by Sputtering for Electrochromic Applications

Chien Cheng Liu; Kuang I Liu; Chiung Wen Chang; Hao Tung Lin

doi:10.4028/www.scientific.net/AMR.626.215

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 626Investigation of Vanadium Oxide Thin Film...

Investigation of Vanadium Oxide Thin Film Deposited by Sputtering for Electrochromic Applications

Abstract:

Vanadium oxide films were deposited on ITO (Indium Tin oxide) glass substrates at room temperature by reactive DC magnetron sputtering. The effect of annealing temperature on composition, microstructure, optical properties, and electrochromic properties of vanadium oxide films were investigated by X-ray diffraction, field-emission scanning electron microscope (FE-SEM), UV-visible spectrometer, and cyclic voltammetry. These films showed (110) crystalline orientation after annealing at 300 °C. V₂O₅ films with more porosity had better electrochromic property and optimal performance after heat treatments.

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Advanced Materials Research (Volume 626)

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215-218

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https://doi.org/10.4028/www.scientific.net/AMR.626.215

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Online since:

December 2012

Authors:

Chien Cheng Liu, Kuang I Liu, Chiung Wen Chang, Hao Tung Lin

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Electrochromism, Magnetron Sputtering, Vanadium Oxide

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