Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target

Zulkifli Mohd Rosli; Kwan Wai Loon; Jariah Mohd Juoi; Nafarizal Nayan; Zainab B. Mahamud; Yusliza Yusuf

doi:10.4028/www.scientific.net/AMR.626.298

Paper Titles

Corrosion Behavior of AZ91 Mg-Alloy Coated with AlN and TiN in NaCl and Hank's Solution
p.275

Physical and Mechanical Properties of Glass Composite Material Made from Incinerated Scheduled Waste Slag and SLS Waste Glass
p.280

BET Analysis on Carbon Nanotubes: Comparison between Single and Double Stage Thermal CVD Method
p.289

Rheological Properties of Zirconia Toughened Alumina Powder for Ceramic Injection Molding
p.294

Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target
p.298

Effect of Annealing Temperature on Surface Morphology of Lanthanum Phosphate (LaPO₄) Nanostructures Thin Films
p.302

Effect of Multiwall Carbon Nanotubes (MWCNT) on Mechanical and Electrical Properties of PP/C Composites as Alternative Materials for Bipolar Plate Fuel Cell
p.306

The Study of the Surface Morphology of PVDF/MgO Nanocomposites Thin Films
p.311

Surface Modification of Polyvinylidenefluoride-Trifluoroethylene Film Using Argon Gas Plasma
p.317

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 626Characterization of TiAlBN Nanocomposite Coating...

Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target

Abstract:

TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and-150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB₂ amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB₂ nanocomposite. On the other hand, it was found that optimum bias voltage used in present study is-60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at-60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers).

You might also be interested in these eBooks

Advanced Materials Engineering and Technology

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 626)

Pages:

298-301

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.626.298

Citation:

Cite this paper

Online since:

December 2012

Authors:

Zulkifli Mohd Rosli, Kwan Wai Loon, Jariah Mohd Juoi, Nafarizal Nayan, Zainab B. Mahamud, Yusliza Yusuf

Keywords:

GAXRD, Nanocomposite, RF Magnetron Sputtering, Rockwell-C Adhesion Test, TiAlBN Coating, XPS

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] S. Zhang, D. Sun, Y. Fu, and H. Du: Surf. Coat. Technol. Vol. 167 (2003), pp.113-119.

Google Scholar

[2] S. Veprek, R.F. Zhang, M.G.J. Veprek-Heijman, S.H. Sheng, and A.S. Argon: Surf. Coat. Technol. Vol. 204 (2010), p.1898-(1906).

DOI: 10.1016/j.surfcoat.2009.09.033

Google Scholar

[3] C. Rebholz, M.A. Monclus, M.A. Baker, P.H. Mayrhofer, P.N. Gibson, A. Leyland, and A. Matthews: Surf. Coat. Technol. Vol. 201 (2007), pp.6078-6083.

DOI: 10.1016/j.surfcoat.2006.08.121

Google Scholar

[4] C. Rebholz, J.M. Schneider, A.A. Voevodin, J. Steinebrunner, C. Charitidis, S. Logothetidis, A. Leyland, and A. Matthews: Surf. Coat. Technol. Vol. 113 (1999), pp.126-133.

DOI: 10.1016/s0257-8972(98)00840-8

Google Scholar

[5] J. Morales-Hernandez, L. Garcia-Gonzalez, J. Munoz-Saldana, and F.J. Espinoza-Beltran: Vacuum Vol. 76 (2004), pp.161-164.

Google Scholar

[6] M.A. Baker, S. Klose, C. Rebholz, A. Leyland, and A. Matthews: Surf. Coat. Technol. Vol. 151-152 (2002), pp.338-343.

Google Scholar

[7] M.A. Baker, M.A. Monclus, C. Rebholz, P.N. Gibson, A. Leylang, and A. Matthews: Thin Solid Films Vol. 518 (2010), pp.4273-4280.

DOI: 10.1016/j.tsf.2009.12.109

Google Scholar

[8] D.V. Shtansky, K. Kaneko, Y. Ikuhara, and E.A. Levashov: Surf. Coat. Technol. Vol. 148 (2001), pp.206-215.

Google Scholar

[9] I. Zukerman, A. Raveh, Y. Shneor, R. Shneck, J.E. Klemberg-Saphieha, and L. Martinu: Surf. Coat. Technol. Vol. 201 (2007), pp.6161-6166.

DOI: 10.1016/j.surfcoat.2006.08.136

Google Scholar

[10] D.M. Mattox: Handbook of Physical Vapor Deposition (PVD) Processing: Second Edition (Elsevier, USA 2010).

DOI: 10.1016/b978-0-8155-2037-5.00018-6

Google Scholar

[11] S.Y. Tan, X.H. Zhang, X.J. Wu, F. Fang, J.Q. Jiang: Thin Solid Films Vol. 519 (2011), pp.2116-2120.

Google Scholar

[12] W. Heinke, A. Leyland, A. Matthews, G. Berg, C. Friedrich, E. Broszeit: Thin Solid Films Vol. 270 (1995), pp.431-438.

DOI: 10.1016/0040-6090(95)06934-8

Google Scholar

[13] U. Wahlstrom, L. Hultman, and J. -E. Sundgren: Thin Solid Films Vol. 235 (1993), pp.62-70.

Google Scholar