Manganese K- and L3-Edge X-Ray Absorption Fine Structure Study of Zn1-xMnxTe

Wei Zheng; Ling Yun Jang; Jenn Min Lee; Rui Sheng Zheng; Chee Wee Liu; P Becla; Zhe Chuan Geng

doi:10.4028/www.scientific.net/AMR.634-638.2489

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 634-638Manganese K- and L3-Edge X-Ray Absorption Fine...

Manganese K- and L₃-Edge X-Ray Absorption Fine Structure Study of Zn_1-xMn_xTe

Abstract:

High-resolution synchrotron radiation x-ray absorption data on Mn K- and L3-edge for semimagnetic semiconductor Zn1-xMnxTe bulk materials are presented. A detailed analysis of the extended x-ray absorption fine structure by using the IFEFFIT program, and the chemical bonds of Mn-Te are obtained. The x-ray absorption near-edge structure of the Mn K- and L3-edges are investigated, and the electronic structure of Zn1-xMnxTe with various compositions are studied.

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Advanced Materials Research (Volumes 634-638)

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2489-2492

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.634-638.2489

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January 2013

Authors:

Wei Zheng, Ling Yun Jang, Jenn Min Lee, Rui Sheng Zheng, Chee Wee Liu, P Becla, Zhe Chuan Geng

Keywords:

Extended X-Ray Absorption Fine Structure, X-Ray Absorption Fine Structure, X-Ray Absorption Near-Edge Structure (XANES), ZnMnTe

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