High Quality Porous Anodic Alumina Membrane Growing on Micron Thickness Aluminum Film Sputtered on Silicon Substrate

Jun Jun Wu; Dan Li; Kai Ge Wang; Chen Zhang; Xiao Yun Hu; Ai Zi Jin; Chang Zhi Gu; Liang Liang Zhang

doi:10.4028/www.scientific.net/AMR.662.16

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 662High Quality Porous Anodic Alumina Membrane...

High Quality Porous Anodic Alumina Membrane Growing on Micron Thickness Aluminum Film Sputtered on Silicon Substrate

Abstract:

The porous anode alumina (PAA) films on silicon substrate with good physicochemical properties have hopeful for the nano-scale devices. The various factors which influence the preparation of high performance PAA film based on silicon were systematically studied, the DC magnetron sputtering technology was used to deposit aluminum and the two-step anodic oxidation method to growth PAA membrane. The results demonstrated that about 2 μm aluminum film deposited on the p-type silicon substrate, in advance deposited 50 nm Ti film on the Si substrate, can get high quality Si-based PAA membrane with good adhesivity, stable structure and consistent pore shape and diameter.

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Periodical:

Advanced Materials Research (Volume 662)

Pages:

16-19

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.662.16

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Online since:

February 2013

Authors:

Jun Jun Wu, Dan Li, Kai Ge Wang, Chen Zhang, Xiao Yun Hu, Ai Zi Jin, Chang Zhi Gu, Liang Liang Zhang

Keywords:

Adhesivity, Magnetron Sputtering, Nanopore, Silicon-Based Porous Anodic Alumina

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