Surface Morphology and Compositional Analysis of Undoped Amorphous Carbon Thin Films via Bias Assisted Pyrolysis-CVD

Abstract:

Amorphous carbon (a:C) were successfully deposited on the silicon surfaces via bias assisted pyrolysis-CVD in the range between 350oC to 500oC with constant of negative bias -50V in 1 hour deposition. The heated of palm oil at about 150oC was vaporized then used for deposited onto p-type silicon substrates. The deposited thin films were characterized by using field emission scanning electron microscopic (FESEM), energy dispersive analyser x-ray (EDAX). We have found carbon element at about 0.15 keV from EDAX with surface morphology formed a nano-ball like structure at 450oC of palm oil precursor. These results indicated deformation of physical and structural thin films caused by applied negative bias and the temperature.

• Periodical: Advanced Materials Research (Volume 667)
• Pages: 468-476
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.667.468
• Online since: March 2013
• Authors: A. Ishak, K. Dayana, Mohamad Rusop
• Keywords: Amorphous Carbon, Carbon, Chemical Vapor Deposition (CVD), DC Bias, FESEM, Negative Bias, Pyrolysis, Thermal CVD, Thin Film

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