Physical Properties of Nano-Structured Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Sputtering

Abstract:

In this work, ZnO thin films were deposited by RF Magnetron sputtering at different substrate temperatures in the range of 100-400oC on glass substrate. The thin films were characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), and I-V measurement, for morphology and electrical properties study. Field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM) were used to study the structural and morphology of the thin films. The particle size varied from 41nm to 146nm showing that the nucleation of ZnO thin films as the substrate temperatures increased. Higher particle size was observed as the substrate temperatures increased up to 400oC as well as high conductivity of thin films at 400oC.

• Periodical: Advanced Materials Research (Volume 667)
• Pages: 495-500
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.667.495
• Online since: March 2013
• Authors: I. Saurdi, Mohamad Hafiz Mamat, Mohamad Rusop
• Keywords: Electrical Properties, Sputtering, Substrate Temperature, Surface Morphology, Zinc Oxide (ZnO)

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