Influence of Annealing Temperature on the Properties of Nanostructured ZnO Thin Film Prepared by Sol-Gel Method

M.S. Mansor; Mohamad Hafiz Mamat; Z. Mohamad; Mohamad Rusop

doi:10.4028/www.scientific.net/AMR.667.558

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 667Influence of Annealing Temperature on the...

Influence of Annealing Temperature on the Properties of Nanostructured ZnO Thin Film Prepared by Sol-Gel Method

Abstract:

Nanostructured ZnO thin film has been prepared by using sol-gel method. The influence of annealing temperature on the structural, surface morphology and the properties has been investigated. The morphology of the nanostructured ZnO was observed by scanning electron microscopy (SEM) and their properties were measured by using the I-V measurement. The annealing temperature of 500°C, 600°C and 700°C has been observed and the I-V measurements were measured at different relative humidity to studies on the sensitivity of the nanostructured ZnO. The SEM demonstrates that the glass substrate was deformed at 700°C of annealing temperature and I-V measurement studies shows that the resistance of nanostructured ZnO thin film is decreased with annealing temperature and relative humidity. Sensitivity also decreases with the increases of annealing temperature.

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Periodical:

Advanced Materials Research (Volume 667)

Pages:

558-561

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.667.558

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Online since:

March 2013

Authors:

M.S. Mansor, Mohamad Hafiz Mamat, Z. Mohamad, Mohamad Rusop

Keywords:

Annealing Temperature, Nanostructured ZnO, Sol-Gel Method

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