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Synthesis of SiO2/CeO2 Nanopaticles with Core/Shell Structure and Their Polishing Performance

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Abstract:

CMP is commonly recognized to be the most effective technique of achieving global planarization. SiO2 and CeO2 abrasives are the most commonly used in CMP slurries due to their good polish performance. To consider respectiveSubscript text advantages and synergistic effect, preparation of SiO2/CeO2 composite nanoparticles with core/shell structure have become a hot topic in CMP field. We introduced the preparation technology of SiO2/CeO2 and their applications in CMP in recent years.

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Periodical:

Advanced Materials Research (Volume 683)

Pages:

30-33

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.683.30

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Online since:

April 2013

Authors:

Li Juan Mu, Zhong Yi Zhang, Li Ye Zhang, Chuan Dong Chen, Zeng Qi Zhao

Keywords:

Core/Shell Structure, Polishing Performance, SiO2/CeO2 Nanopaticles

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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