Effects of Preparing Conditions on NO2-Sensing Properties of Sputtered WO3 Nano-Films

Feng Yun Sun; Ming Hu; Peng Sun

doi:10.4028/www.scientific.net/AMR.690-693.1680

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 690-693Effects of Preparing Conditions on NO2-Sensing...

Effects of Preparing Conditions on NO₂-Sensing Properties of Sputtered WO₃ Nano-Films

Abstract:

WO₃ nano-films were deposited on Al₂O₃ substrate by dc reactive magnetron sputtering method. The effects of preparing conditions, such as the discharge gas ratio (Ar:O2), working pressure, sputtering time and annealing temperature on microstructure, crystalline state and NO2-sensing properties of WO₃ nano-films were investigated by orthogonal trial experiment method. The optimum technological conditions were determined by orthogonal test and extreme difference analysis. The crystallization, morphology and composition of WO₃ thin film obtained at the optimal parameters were studied by XRD, SEM and XPS. The gas sensing mechanism was also studied. WO₃ nano-film shows high sensitivity, fast response, good selectivity at the best operating temperature 200°C.

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Periodical:

Advanced Materials Research (Volumes 690-693)

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1680-1684

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.690-693.1680

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May 2013

Authors:

Feng Yun Sun, Ming Hu, Peng Sun

Keywords:

NO₂-Sensing Property, Orthogonal Trial Experimen, Reactive Magnetron Sputtering, WO₃ Nano-Film

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