Thin Film Microcircuit Preparation in a Diamond Anvil Cell

Jia Wang; Bao Jia Wu

doi:10.4028/www.scientific.net/AMR.690-693.499

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 690-693Thin Film Microcircuit Preparation in a Diamond...

Thin Film Microcircuit Preparation in a Diamond Anvil Cell

Abstract:

An effective and convenient method about molybdenum metal thin film microcircuit was developed on diamond anvil cell(DAC) under high pressure. Alumina film was used as the protective layer and sputtered on DAC. By using this method, we studied the electrical resistance variation about nanoparticles ZnS power up to 36GPa. The reversible phase transition had been reflected clearly by the electrical resistance measurements with sample.

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Advanced Materials Research (Volumes 690-693)

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499-502

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https://doi.org/10.4028/www.scientific.net/AMR.690-693.499

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May 2013

Authors:

Jia Wang, Bao Jia Wu

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Diamond Anvil Cell, Resistance, Thin Film Microcircuit

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