T-BN Powders Prepared by Chemical Vapor Deposition Using BCl3, NH3 and Ar

Ling Wei Yang; Hai Feng Cheng; Jun Sheng Li

doi:10.4028/www.scientific.net/AMR.706-708.314

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 706-708T-BN Powders Prepared by Chemical Vapor Deposition...

T-BN Powders Prepared by Chemical Vapor Deposition Using BCl₃, NH₃ and Ar

Abstract:

T-BN powders were successfully prepared by chemical vapor deposition method using BCl₃, NH₃ and Ar. The as received BN was less crystallized with turbostratic structure. The morphology of the powders was standard circular which is due to the homogeneous nucleation. The chemical composition of the BN powders was B and N, with B-N bonding.Keywords: Boron Nitride; Chemical vapor deposition; Structure

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Periodical:

Advanced Materials Research (Volumes 706-708)

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314-317

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.706-708.314

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June 2013

Authors:

Ling Wei Yang, Hai Feng Cheng, Jun Sheng Li

Keywords:

Boron Nitride, Chemical Vapor Deposition (CVD), Structure

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