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Surface Properties of the Ta and Ag Dual-Ion-Implanted Ti6Al4V Alloy

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Abstract:

First, Ti6Al4V alloy samples were modified by tantalum ion implantation at a dose of 1.5×1017 ions/cm2, and then silver ion at a dose of 1×1017 ions/cm2. Glancing angle X-ray diffraction analysis was used to characterize the phase composition of un-implanted Ti6Al4V alloy and Ta+Ag dual-ion-implanted Ti6Al4V alloy samples. X-ray photoelectron spectroscopy analysis was used to investigate the chemical states of the elements on the Ta+Ag dual-ion-implanted Ti6Al4V alloy sample’s surface. The results show that small amounts of Ta and Ag were present in their elementary forms, along with TiO2, Ta2O5, and TaOx.

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Periodical:

Advanced Materials Research (Volume 738)

Pages:

78-82

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.738.78

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Online since:

August 2013

Authors:

Chong Yan Leng, Rong Zhou, Xu Zhang

Keywords:

Dual-Ion Implantation, Surface Properties, Ti6Al4V

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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