Effect of Annealing Temperature on Structure and Optical Properties of Ta2O5 Thin Films Prepared by DC Magnetron Sputtering

T. Plirdpring; M. Horprathum; C. Chananonnawathorn; P. Eiamchai; A. Harnwunggmoung; T. Boonpichayapha; P. Lorwongtragool; Anek  Charoenphakdee

doi:10.4028/www.scientific.net/AMR.770.149

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 770Effect of Annealing Temperature on Structure and...

Effect of Annealing Temperature on Structure and Optical Properties of Ta₂O₅ Thin Films Prepared by DC Magnetron Sputtering

Abstract:

Tantalum oxide (Ta₂O₅) films at 400 nm thickness were prepared at room temperature by DC reactive magnetron sputtering. The effect of annealing temperature on film crystallinity, microstructure and optical properties were investigated. In order to indentify the crystalline structure and film morphology, X-ray diffraction (XRD) and field-emission scanning electron microscope (FE-SEM) measurements were performance. The optical properties were determined by UV-Vis spectrophotometer and spectroscopic ellipsometry (SE). The result showed that, with the annealing treatment at high temperature (700-900°C), the as-deposited films were crystallized to orthorhombic phase of tantalum pentaoxide (β-Ta₂O₅). In addition, the transmittance spectrum percentage indicated 87%, which corresponded to the obtained optical characteristic. The refractive index varied at 550 nm from 2.17 to 2.21 with increased of the annealing temperature.

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Periodical:

Advanced Materials Research (Volume 770)

Pages:

149-152

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.770.149

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Online since:

September 2013

Authors:

T. Plirdpring, M. Horprathum, C. Chananonnawathorn, P. Eiamchai, A. Harnwunggmoung, T. Boonpichayapha, P. Lorwongtragool, Anek Charoenphakdee

Keywords:

Annealing, Optical Property, Sputtering, Tantalum Oxide Thin Films

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