Preparation and Characterization of Nanostructured TiN Thin Films Deposited by DC Reactive MagnetronSputtering

Abstract:

Titanium nitride (TiN) thin films of different crystal structure and morphologies were deposited by direct current (dc) reactive magnetron sputtering method under conditions of various deposition times (3090 min). The crystal structure, crystal size, thickness and surface morphology properties of the films were studied and the results were discussed with respect to deposition time. The films were deposited on Si (100) and stainless steel substrates with constant Ar to N₂ ratio of 15:2 sccm and sputtering power of 280 W. The crystal structure was characterized by X-ray diffraction. The Scherrers formula was used to calculated crystal size. The surface morphology and thickness were evaluated by Atomic Force Microscope (AFM). The golden coloured with uniformnity of TiN films were obtained at deposition time for 30 min. The as-deposited films color was varied with the deposition times from gold, brown and dark brown. The polycrystalline films showed reflections corresponding to the (111), (200), (220) and (311) orientations of the face center cubic TiN structure. The crystallinity of the films was increased with increased the deposition times. The AFM results indicate that the grain size of surface morphologies changed through the deposition times. With increase in deposition time, the roughness and films thickness were increased from 5.0 nm to 21.0 nm and 551.0 nm to 1.4 μm, respectively.

• Periodical: Advanced Materials Research (Volume 770)
• Pages: 165-168
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.770.165
• Online since: September 2013
• Authors: Adisorn Buranawong, Komgrit Saisereephap, Nirun Witit-Anun, Jakrapong Kaewkhao, Surasing Chaiyakun
• Keywords: Nanostructured, Reactive Magnetron Sputtering, TiN Thin Film

References

[1] Y.L. Jeyachandran, Sa.K. Narayandass, D. Mangalaraj, S. Areva, J.A. Mielczarski, Properties of titanium nitride films prepared by direct current magnetron sputtering, Mat. Sci. Eng. A. 445-446 (2007) 223 -236.

DOI: 10.1016/j.msea.2006.09.021

[2] P.J. Kelly, T. vomBraucke, Z. Liu, R.D. Arnell, E.D. Doyle, Pulsed DC titanium nitride coatings for improved tribological performance and tool life, Surf. Coat. Technol. 202 (2007) 774 -780

DOI: 10.1016/j.surfcoat.2007.07.047

[3] S.H. Ahn, J.H. Hong, J.G. Kim, J.G. Han, Effect of microstructure on corrosion behavior of TiN hard coatings produced by a modified two-grid attachment magnetron sputtering process, Thin Solid Films. 515 (2007) 6878 -6883.

DOI: 10.1016/j.tsf.2007.01.025

[4] F. Vaz, P. Cerqueira, L. Rebouta, S.M.C. Nascimento, E. Alves, Ph. Goudeau, J.P. Riviere, K. Pischow, J. de Rijk, Structural, optical and mechanical properties of coloured TiNxOy thin films, Thin Solid Films. 447–448 (2004) 449 -454.

DOI: 10.1016/s0040-6090(03)01123-4

[5] G.B. Smith, A. Ben-David, P.D. Swift, A new type of TiN coating combining broad visible transparency and solar control, Renew. Energ. 22 (2001) 79 -84.

DOI: 10.1016/s0960-1481(00)00071-9

[6] I. Iordanov, P.J. Kelly, M. Burov, A. Andreev, B. Stefanov, Influence of thickness on the crystallography and surface topography of TiN nano-films deposited by reactive DC and pulsed, Thin Solid Films. 520 (2012) 5333 -5339.

DOI: 10.1016/j.tsf.2012.03.097

[7] K. Kato, H. Omoto, A. Takamatsu, T. Tomioka, Crystal orientation control of polycrystalline TiN thin films using ZnO under layers deposited by magnetron sputtering, Appl. Surf. Sci. 258 (2011) 687 -694.

DOI: 10.1016/j.apsusc.2011.07.098

[8] T. Mori, S. Fukuda, Y. Takemura, Improvement of mechanical properties of Ti/TiN multilayer film deposited by sputtering, Surf. Coat. Technol. 140 (2001) 122 -127.

DOI: 10.1016/s0257-8972(01)01021-0