Growth of Anatase TiO2 Thin Film for Photokilling of Bacteria by DC Reactive Magnetron Sputtering Technique

Suree Tongwanichniyom; Wichian Siriprom; Dhonluck Manop; Adisorn Buranawong; Jakrapong Kaewkhao; Nirun Witit-Anun

doi:10.4028/www.scientific.net/AMR.770.173

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 770Growth of Anatase TiO2 Thin Film for Photokilling...

Growth of Anatase TiO₂ Thin Film for Photokilling of Bacteria by DC Reactive Magnetron Sputtering Technique

Abstract:

Titanium dioxide (TiO₂) thin films have been deposited on Si-wafer and glass slide by DC reactive magnetron sputtering technique at different O₂ gas flow rates. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD), surface morphology was analyzed by atomic force microscopy (AFM) and disinfection of surfaces by photo catalytic oxidation with TiO₂ and UV light irradiation. The results showed that, from GIXRD results, all as-deposited TiO₂ films have crystal structure of TiO₂ corresponding to the A(101) and A(200). AFM results showed that the film thicknesses increase from 183 nm to 238 nm with increasing of O₂ gas flow rate, while the film roughness was in range of 4.8 nm to 5.9 nm. The as-deposited anatase TiO₂ thin film in this work can kill the bacteria when expose to the UV light.

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Periodical:

Advanced Materials Research (Volume 770)

Pages:

173-176

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.770.173

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Online since:

September 2013

Authors:

Suree Tongwanichniyom, Wichian Siriprom, Dhonluck Manop, Adisorn Buranawong, Jakrapong Kaewkhao, Nirun Witit-Anun

Keywords:

DC Reactive Magnetron Sputtering, Photokilling of Bacteria, Titanium Dioxide Thin Films

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