Annealing Temperature Dependent on Microstructure and Ethanol Gas Sensing Properties of TiO2Thin Films

Benjarong Samransuksamer; Worawarong Rakreungdet; Supattanapong Dumrongrattana; M. Horprathum; Pitak Eiamchai; Viyapol Patthanasettakul; Anurat Wisitsoraat; Pongpan Chindaudom

doi:10.4028/www.scientific.net/AMR.770.213

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 770Annealing Temperature Dependent on Microstructure...

Annealing Temperature Dependent on Microstructure and Ethanol Gas Sensing Properties of TiO₂Thin Films

Abstract:

The TiO₂ thin films were prepared by a dc reactive magnetron sputtering technique from high purity Ti target on silicon (100) wafers and alumina substrates inter-digital with gold electrodes. The as-deposited films were annealed from 400°C up to 800°C with 100 °C steps for 1 hour in air ambience in order to promote microstructure, morphology and gas-sensing properties. The change in microstructure and morphology of the films were investigated by X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). The enhancement in the gas-sensing properties was test by ethanol gas. The prepared thin films were exposed to ethanol gas at concentration 1,000 ppm in purify dry air carrier. The resistance was measured as a function of the ethanol concentration of the films at operated temperatures in the range of 250 - 350°C. The influence of annealing temperature at 500 °C of TiO₂ thin film has a highest sensitivity at 350 °C operated temperature.

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Periodical:

Advanced Materials Research (Volume 770)

Pages:

213-216

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.770.213

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Online since:

September 2013

Authors:

Benjarong Samransuksamer, Worawarong Rakreungdet, Supattanapong Dumrongrattana, M. Horprathum, Pitak Eiamchai, Viyapol Patthanasettakul, Anurat Wisitsoraat, Pongpan Chindaudom

Keywords:

Annealing, Ethanol Gas Sensing, Sputtering, TiO₂ Thin Film

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