Structural and Optical Properties of TiO2 Thin Films Prepared by Thermal Oxidation of Ti Thin Films

L. Uttayan; Kamon Aiempanakit; M. Horprathum; P. Eiamchai; V. Pattantsetakul; N. Nuntawong; Pongpan Chindaudom

doi:10.4028/www.scientific.net/AMR.770.225

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 770Structural and Optical Properties of TiO2 Thin...

Structural and Optical Properties of TiO₂ Thin Films Prepared by Thermal Oxidation of Ti Thin Films

Abstract:

Titanium dioxide (TiO₂) films were prepared by thermal oxidation from Ti films. The Ti films were deposited on glass and silicon (100) wafer substrate by dc magnetron sputtering and subsequent with thermal oxidation process. The crystal structure and morphology of TiO₂ films were estimated by using X-ray diffractometry (XRD) and field-emission scanning electron microscopy (FE-SEM), respectively. The optical property of TiO₂ films was determined by UV-Visible spectrophotometer. The influences of annealing temperature between 200 to 500°C in air for 1 hour on the structure and optical properties of TiO₂ films were investigated. The increasing of annealing temperature was directly affected the phase transition from Ti to TiO₂. The optical and structural properties of TiO₂ films are the best exhibited with increasing the annealing temperature at 500 °C.

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Periodical:

Advanced Materials Research (Volume 770)

Pages:

225-228

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.770.225

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Online since:

September 2013

Authors:

L. Uttayan, Kamon Aiempanakit, M. Horprathum, P. Eiamchai, V. Pattantsetakul, N. Nuntawong, Pongpan Chindaudom

Keywords:

Optical Property, Thermal Oxidation, Titanium Dioxide (TiO₂)

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