Effect of Thickness on Microstructure, Electrical and Optical Properties of Zirconium Nitride Thin Film Prepared by DC Reactive Magnetron Sputtering at Room Temperature

Mano Valaiauksornlikit; Worawarong Rakreungdet; Mati Horprathum; Pitak Eiamchai; Viyapol Patthanasettakul; Pongpan Chindaudom

doi:10.4028/www.scientific.net/AMR.770.217

Paper Titles

Development of Barium Borosilicate Glass Using Rice Husk Ash: Effect of BaO
p.201

Fabrication of Glass Foams from Industrial Wastes Used as Insulating Board
p.205

Synthesis of Faujasite and Analcime Using of Rice Husk Ash and Metakaolin
p.209

Annealing Temperature Dependent on Microstructure and Ethanol Gas Sensing Properties of TiO₂Thin Films
p.213

Effect of Thickness on Microstructure, Electrical and Optical Properties of Zirconium Nitride Thin Film Prepared by DC Reactive Magnetron Sputtering at Room Temperature
p.217

Fabrication and Characterization of Antibacterial Ag-TiO₂ Thin Films Prepared by DC Magnetron Co-Sputtering Technique
p.221

Structural and Optical Properties of TiO₂ Thin Films Prepared by Thermal Oxidation of Ti Thin Films
p.225

Study of the Intensity of Global Solar Radiation Incident in Suan Sunandha Rajabhat University
p.229

The Increment Valuated of Natural Ruby by Heat Treatment
p.233

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 770Effect of Thickness on Microstructure, Electrical...

Effect of Thickness on Microstructure, Electrical and Optical Properties of Zirconium Nitride Thin Film Prepared by DC Reactive Magnetron Sputtering at Room Temperature

Abstract:

Zirconium Nitride (ZrN) thin films were prepared by dc reactive magnetron sputtering without an external substrate heating on silicon (100) wafer and glass slide. The as-deposited films obtained from different conditions and various films thickness was investigated for physical, optical and electrical properties. First, the microstructure and film morphology were examined by X-ray diffraction (XRD), field-emission scanning electron microscope (FE-SEM). The optical transparency was measured by UV-vis spectrophotometer. Finally, the electrical properties, based on measured resistivity, were studied by four-point probe. The result showed that the ZrN films were all well orientated in the (111) plane. When the film thickness was increased, the grain size was also increased. The effect of the film thickness was observed in the charge in colors and optical transmission of the films.

You might also be interested in these eBooks

Applied Physics and Material Applications

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 770)

Pages:

217-220

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.770.217

Citation:

Cite this paper

Online since:

September 2013

Authors:

Mano Valaiauksornlikit, Worawarong Rakreungdet, Mati Horprathum, Pitak Eiamchai, Viyapol Patthanasettakul, Pongpan Chindaudom

Keywords:

Sputtering, Thin Film, Zirconium Nitride (ZrN)

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] S. Schleussner, T. Kubart, T. Tӧrndahl, M. Edoff, Reacticely sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se2 solar cells, Thin Solid Films. 517 (2009) 5548-5552.

DOI: 10.1016/j.tsf.2009.03.196

Google Scholar

[2] H. Jimѐnez, E. Restrepo, A. Devia, Effect of the substrate temperature in ZrN coatings grown by the pulsed arc technique studied by XRD, Surf. Coat. Technol. 201 (2006) 1594-1601.

DOI: 10.1016/j.surfcoat.2006.02.030

Google Scholar

[3] H.M. Benia, M. Guemmaz, G. Schmerber, A. Mosser, J.-C. Parlebas, Investigations on non-stoichiometic zirconium nitrides, Appl. Surf. Sci. 200 (2002) 231-238.

DOI: 10.1016/s0169-4332(02)00925-x

Google Scholar

[4] S. Niyomsoan, W. Grant, D.L. Olson, B. Mishra, Variation of color in titanium and zirconium nitride decorative thin films, Thin Solid Films. 415 (2002) 187-194.

DOI: 10.1016/s0040-6090(02)00530-8

Google Scholar