Preparation and Properties of TiN Thin Films by D.C. Reactive Magnetron Sputtering

Abstract:

Article Preview

TiN thin films were deposited by D.C reactive magnetron sputtering on glass and metal substrate. The relations between the technical conditions and the properties of the thin films are studied, According to control the intensity of gas pressure by changing the flux of Ar and N2, the structure of TiN films could be control. By changing the target power、N2 flux and substrate temperature, the relations between the technical conditions and the structure of TiN thin films were analyzed so as to produce the TiN thin films of excellent decorations, good corrosion resistance and high micro-hardness.

Info:

Periodical:

Advanced Materials Research (Volumes 79-82)

Edited by:

Yansheng Yin and Xin Wang

Pages:

2275-2278

DOI:

10.4028/www.scientific.net/AMR.79-82.2275

Citation:

Y. Q. Shan et al., "Preparation and Properties of TiN Thin Films by D.C. Reactive Magnetron Sputtering", Advanced Materials Research, Vols. 79-82, pp. 2275-2278, 2009

Online since:

August 2009

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.