Crystal Orientation and Hardness of Au/NiCr/Ta Films on Si-(111) Substrate Prepared by Magnetron Sputtering

Abstract:

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Au/NiCr/Ta soft multi-layered metal films were deposited on hard Si-(111) substrate by magnetron sputtering. The crystal orientation, Hardness (H) and Elastic modulus (E) were investigated as a function of substrate temperature by XRD and nanoindentation techniques. The XRD revealed that all films on Si-(111) substrate are Au-(111) preferred orientation, indicating there are no alloying phases in the films, which is different from Au/NiCr/Ta films on Al2O3 substrate with a mixture of Au-(111) and Au-(200) orientation. Nanoindentation tests at shallow indentation depths (h≤t/4) where the hardness is reliable for metal films on hard substrate. Au film at substrate temperature 200°C has the highest hardness 4.2GPa. Meanwhile, the H/E value also indicated that the Au/NiCr/Ta films have preferable wear resistance at substrate temperature 200°C.

Info:

Periodical:

Advanced Materials Research (Volumes 79-82)

Edited by:

Yansheng Yin and Xin Wang

Pages:

719-722

DOI:

10.4028/www.scientific.net/AMR.79-82.719

Citation:

W. Tang et al., "Crystal Orientation and Hardness of Au/NiCr/Ta Films on Si-(111) Substrate Prepared by Magnetron Sputtering", Advanced Materials Research, Vols. 79-82, pp. 719-722, 2009

Online since:

August 2009

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$35.00

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