Effect of Sputtering Power on Physical Properties and Electrochromic Performance of Sputtered-WO3 Thin Films

Russameeruk Noonuruk; K. Paipitak; Mati Horprathum; Wicharn Techitdheera; Supanit Porntheeraphat; Wisanu Pecharapa

doi:10.4028/www.scientific.net/AMR.802.69

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 802Effect of Sputtering Power on Physical Properties...

Effect of Sputtering Power on Physical Properties and Electrochromic Performance of Sputtered-WO₃Thin Films

Abstract:

Tungsten oxide (WO₃) electrochromic thin films were deposited onto F-doped tin oxide (FTO) substrates using DC sputtering of tungsten target in presence of oxygen and argon gas. As-deposited films were prepared with different sputtering power at 50 W, 100W and 200W. The effect of power on structural, surface morphology optical and electrochromic properties of the WO₃ thin films were characterized by X-ray diffractometer, scanning electron microscope, UV-VIS spectrophotometer and Cyclic voltammetry, respectively. The XRD results show that the crystalline of WO₃ can be identified an orientation growth along (222) plane. The average grain size evaluated from SEM image is approximately 200 nm. The films deposited at power of 200 W exhibited better electrochromic properties with greatest optical modulation (∆T) value of ∆T = 31.2 % at l= 550 nm. The cyclic voltammograms (CV) of WO₃ thin films evidently exhibited that the WO₃ films prepared at power of 200 W displayed the superior electrochromic performance, compared to the others.

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Periodical:

Advanced Materials Research (Volume 802)

Pages:

69-73

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.802.69

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Online since:

September 2013

Authors:

Russameeruk Noonuruk, K. Paipitak, Mati Horprathum, Wicharn Techitdheera, Supanit Porntheeraphat, Wisanu Pecharapa

Keywords:

DC Sputtering, Electrochromic, WO₃Thin Films

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