The Optimal Design of the Plasma Discharge Structure of the Far Zone of the Hollow Cathode

Yi Fang Wen; Yan Nian Rui; Chuang Chen; Hong Wei Wang

doi:10.4028/www.scientific.net/AMR.819.344

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 819The Optimal Design of the Plasma Discharge...

The Optimal Design of the Plasma Discharge Structure of the Far Zone of the Hollow Cathode

Abstract:

The discharge of RF hollow cathode far zone plasma has advantages of high ion concentration, easy to implement the processing of a large area, given more and more attention. The characteristics of hollow cathode plasma flow have a great relationship with the hollow cathode nozzle structure. How to design the hollow cathode nozzle discharge structure accurately and conveniently is the key problem of the hollow cathode far plasma surface treatment. This article builds a hollow cathode plasma discharge self-consistent model; derive the relationship between the discharge current of the hollow cathode plasma and the hollow cathode nozzle structure. Optimize the design of the hollow cathode discharge structure using discharge particle simulation software, to achieve a fast and accurate design and the purpose of efficient plasma surface modification.

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Periodical:

Advanced Materials Research (Volume 819)

Pages:

344-349

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.819.344

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Online since:

September 2013

Authors:

Yi Fang Wen, Yan Nian Rui, Chuang Chen, Hong Wei Wang

Keywords:

Hollow Cathode Discharge, Hollow Cathode Nozzle, Optimal Design

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