Effects of Oxygen Gas Composition on Nanocolumnar Zinc Oxide Properties Deposited by RF Magnetron Sputtering

Abstract:

Nanocolumnar ZnO was successfully deposited on glass substrate by RF magnetron sputtering. It was performed with a ZnO target with 99.999% purity at RF power of 200 W. The growth temperature was specified at 500°C, with total deposition time of 1 hour. The effects of oxygen gas composition during sputtering process was investigated. Argon to oxygen ratio was varied at Ar10:Ox5, Ar8:Ox7 and Ar5:x10 sccm. Optical characterization on samples indicated that the transmittance though visible range is higher than 80%. Based on morphological property obtained, higher oxygen content exhibited better uniformity and surface roughness. This is due to the reduction of oxygen vacancies in the ZnO layer.

• Periodical: Advanced Materials Research (Volume 832)
• Pages: 783-786
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.832.783
• Online since: November 2013
• Authors: N. Ameera, Ahmad Shuhaimi Abu Bakar, S. Najwa, K.M. Hakim, M. Mazwan, M. Sobri, M.H. Mamat, M.Z. Musa, M. Rusop
• Keywords: Nanostructure, RF Magnetron Sputtering, Zinc Oxide (ZnO)

References

[1] X. Zhang, M.Y. Lu, Y. Zhang, L.J. Chen, Z.L. Wang, Fabrication of a high-brightness blue-light-emitting diode using a ZnO-nanowire array grown on p-GaN thin film, Adv. Mater. 21 (2009) 2767-2770.

DOI: 10.1002/adma.200802686

[2] J. Bian, W. Liu, J. Sun, H. Liang, Synthesis and defect-related emission of ZnO based light emitting device with homo- and heterostructure, J. Mater. Process. Technol. 184 (2007) 451- 454.

DOI: 10.1016/j.jmatprotec.2006.12.011

[3] G. Luka, T. Krajewski, L. Wachnicki, B. Witkowski, E. Lusakowska, W. Paszkowicz, E. Guziewicz, M. Godlewski, Transparent and conductive undoped zinc oxide thin films grown by atomic layer deposition, Phys. Status Solidi A. 207 (2010) 1568-1571.

DOI: 10.1002/pssa.200983709

[4] K. Ellmer, Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties, J. Phys. D:Appl. Phys. 33 (2000) 17.

DOI: 10.1088/0022-3727/33/4/201

[5] S.N. Cha, B.G. Song, J.E. Jung, I.T. Han, J.H. Ha, J.P. Hong, D.J. Kang, J.M. Kim, Controlled growth of vertically aligned ZnO nanowires with different crystal orientation of the ZnO seed layer, Nanotechnology. 19 (2008) 235601-235605.

DOI: 10.1088/0957-4484/19/23/235601

[6] O. Takai, M. Futsuhara, G. Shimizu, C.P. Lungu, J. Nozue, Nanostructure of ZnO thin films prepared by reactive rf magnetron sputtering, Thin Solid Films 318 (1998) 117-119.

DOI: 10.1016/s0040-6090(97)01148-6

[7] C.W. Hsu, T.C. Cheng, C.H. Yang, Y.L. Shen and J.S. Wu, Effects of oxygen addition on physical properties of ZnO thin film grown by radio frequency reactive magnetron sputtering, J. Alloys Compd. 509 (2011) 1774-1776.

DOI: 10.1016/j.jallcom.2010.10.037

[8] I. Sayago, M. Aleixandre, L. Ares, M.J. Fernandez, J.P. Santos, J. Gutierrez, M.C. Horrillo, The effect of the oxygen concentration and the rf power on the zinc oxide films properties deposited by magnetron sputtering, Appl. Surf. Sci. 245 (2005) 273-280.

DOI: 10.1016/j.apsusc.2004.10.035

[9] R. Ondo-Ndong, G. Ferblantier, M. Al Kalfioui, A. Boyer, A. Foucaran, Properties of rf magnetron sputtering zinc oxide thin films, J. Cryst. Growth. 255 (2003) 130-135.

DOI: 10.1016/s0022-0248(03)01243-0