Simulation, Fabrication and Characterization of 6500V 4H-SiC JBS Diode

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Abstract:

4H-SiC JBS diode with breakdown voltage higher than 6.5 kV has been successfully fabricated on 4H-SiC wafers with epitaxial layer. In this paper, the simulation, the fabrication, and the electrical characteristics of 4H-SiC JBS diode were reported. The drift layer thickness and doping are 55 μm and 9×1014 cm3 respectively. 60 floating guard rings edge were fabricated as termination. The on-state voltage was 4 V at JF = 7A.

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Periodical:

Advanced Materials Research (Volumes 846-847)

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737-740

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November 2013

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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