Effect of Argon Gas Pressure on Optical Properties of Zinc Oxide Thin Films Deposited by RF Magnetron Sputtering Technique

Abstract:

Zinc oxide (ZnO) thin films were deposited by radio frequency (RF) magnetron sputtering technique on glass substrates in pure argon gas. The optical transmission stectra of the films were measured by ultraviolet-visible spectrophotometer. The effects of argon gas pressure on optical properties of the deposited films were investigated. The optical band-gap of the films was evaluated in terms of the Taucs law. The results show that the argon gas pressure has slightly affected the optical band-gap of the deposited films. Furthermore, the refractive index and extinction coefficient of the films were determined by means of the optical characterization methods. Meanwhile, the dispersion behavior of the refractive index was studied by the single-oscillator model of Wemple and DiDomenico, and the physical parameters of the average oscillator strength, average oscillator wavelength, oscillator energy, the refractive index dispersion parameter and the dispersion energy were obtained.

• Periodical: Advanced Materials Research (Volume 904)
• Pages: 205-208
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.904.205
• Online since: March 2014
• Authors: J.H. Gu, Z.Y. Zhong*, S.B. Chen, C.Y. Yang, J. Hou
• Keywords: Optical Property, RF Magnetron Sputtering, Zinc Oxide (ZnO)

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