Investigation of UV Light Intensity Distribution of Integral Micro-Stereolithography System

Guang Shen Xu; Huan Pan; Xun Ming Ma; Sheng Luo; Rong Hua Qiu

doi:10.4028/www.scientific.net/AMR.97-101.3985

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 97-101Investigation of UV Light Intensity Distribution...

Investigation of UV Light Intensity Distribution of Integral Micro-Stereolithography System

Abstract:

The non-uniformity distribution of UV light intensity in the imaging plane of integral micro-Stereolithography (µSL) System will induces serious distortion of object in building process, and the building accuracy of the SL system can not be assured. To obtain uniformity distribution of UV light intensity, experimental investigations were performed to research the relationship of UV light intensity with position (x,y) in the imaging plane and gray-scale z of the pattern in the integral µSL System. Based on the experiment results, the model of UV light intensity was established with least squares method. According to the model, for a given point in the imaging plane of the µSL system, the UV light intensity can be changed with varying the gray-scale of the pattern. As a result, Uniformity UV light intensity distribution is obtained in the imaging plane, and the difference between maximum and minimum value of UV light intensity is 0.06µW/cm2. The uniformity UV light intensity distribution provides a foundation for building accurate microstructures with the µSL system.

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Periodical:

Advanced Materials Research (Volumes 97-101)

Pages:

3985-3988

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.97-101.3985

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Online since:

March 2010

Authors:

Guang Shen Xu, Huan Pan, Xun Ming Ma, Sheng Luo, Rong Hua Qiu

Keywords:

Least-Square Method (LSM), Microstereolithography, Rapid Prototyping (RP), UV Light Intensity

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