Fabrication of Tantalum Oxide Nanorods by DC Magnetron Sputtering with Glancing Angle Deposition

T. Plirdpring; M. Horprathum; P. Eiamchai; S. Limwichean; C. Chananonnawathorn; T. Boonpichayapha; Tawat Suriwong

doi:10.4028/www.scientific.net/AMR.979.196

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 979Fabrication of Tantalum Oxide Nanorods by DC...

Fabrication of Tantalum Oxide Nanorods by DC Magnetron Sputtering with Glancing Angle Deposition

Abstract:

This study investigates tantalum oxide (Ta₂O₅) nanorods prepared by the dc magnetron sputtering with the glancing angle deposition (GLAD) technique. Silicon (100) wafer and glass slides were used as the substrates. The effect of the glancing angle varying from 73-87°, on the structural and optical properties were investigated by field-emission scanning electron microscopy (FE-SEM), atomic force microscope (AFM) and spectrophotometry. The results show that the deposition rate and diameter of Ta₂O₅ nanorod films were decreased with the increase in the glancing angle. At the highest glancing angle of 87°, the prepared Ta₂O₅ nanorod yielded the highest porosity from the vertically aligned columnar structure, and were must suitable for many functional applications.

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Periodical:

Advanced Materials Research (Volume 979)

Pages:

196-199

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.979.196

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Online since:

June 2014

Authors:

T. Plirdpring*, M. Horprathum, P. Eiamchai, S. Limwichean, C. Chananonnawathorn, T. Boonpichayapha, Tawat Suriwong

Keywords:

Glancing Angle Deposition, Sputtering, Tantalum Oxide

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