Properties of Indium Tin Oxide Films Prepared by Two-Targets Magnetron Sputtering

Jian Guo Chai

doi:10.4028/www.scientific.net/AMR.997.337

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 997Properties of Indium Tin Oxide Films Prepared by...

Properties of Indium Tin Oxide Films Prepared by Two-Targets Magnetron Sputtering

Abstract:

Indium tin oxide (ITO) films were deposited on glass substrates by magnetron sputtering. Properties of ITO films showed a dependence on substrate temperature. With an increasing in substrate temperature, the intensity of XRD peak increased and the grain size showed an evident increasing. The results show that increasing substrate temperature remarkably improves the characteristics of the films. The sheet resistance of 10 Ω/sq and the maximum optical transmittance of 90% in the visible range with optimized conditions can be achicved. The results of experiment demonstrate that high-quality films have been achieved by this technique.

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Periodical:

Advanced Materials Research (Volume 997)

Pages:

337-340

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.997.337

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Online since:

August 2014

Authors:

Jian Guo Chai*

Keywords:

Film, Indium Tin Oxide, Magnetron Sputtering, Substrate Temperature

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