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The Structure and Electrical Property of sp2 Rich Carbon Films by Magnetron Sputtering

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Abstract:

sp2 rich carbon films were produced by using magnetron sputtering deposition. The hardness, friction coefficient and wear volume were elevated by Knoop micro-hardness and pin-on-disk tester; The composition and microstructure of the carbon films have been characterized in detail by combining the techniques of Rutherford Backscattering Spectrum (RBS), X-Ray Photoelectron Spectrum (XPS) and X-Ray Diffraction (XRD); the electrical resistivity was measured by Four Probe Methods (FPM). It is found that: the films hardness are 11~17GPa (HK0.05), the friction coefficients are 0.1-0.2, the wear rate is 10-15m3/Nm; The maximum intensity position in the C1s indicates the chemical bonds are mainly sp2; the electrical resistivity is 1~2×10-4Ω·m. XRD proves these carbon films are amorphous.

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Periodical:

Advanced Materials Research (Volumes 998-999)

Pages:

120-123

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.998-999.120

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Online since:

July 2014

Authors:

Jun Du*, Xiao Ying Zhu, Yan Zang, Lei Guo

Keywords:

Bond Structure, Carbon Film, Electrical Resistivity, Magnetron Sputtering Deposition

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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