Atmospheric Pressure Plasma-Enhanced CVD for Surface Modification: Principles and Applications

Michael L. Hitchman; Sergei E. Alexandrov

doi:10.4028/www.scientific.net/AST.45.1173

Paper Titles

Selective Transmission of Electromagnetic Wave by Using Diamond Photonic Crystals with Graded Lattice Spacing
p.1139

Development of Multi-Layered and Graded Die Coatings for Materials Processing Applications
p.1145

Development and Application of Coated Ceramic Cutting Tools
p.1155

Suspension Plasma Spraying: From Injection to Coating
p.1163

Atmospheric Pressure Plasma-Enhanced CVD for Surface Modification: Principles and Applications
p.1173

Grain-Focused Microstructure Simulations: Stress-Induced Evolution of Polycrystalline Films
p.1178

Low Temperature MOCVD-Processed Alumina Coatings
p.1184

MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu₃Ti₄O₁₂) Thin Films
p.1194

Sintering of EPD Ceramic Coatings by Electron Beam
p.1200

HomeAdvances in Science and TechnologyAdvances in Science and Technology Vol. 45Atmospheric Pressure Plasma-Enhanced CVD for...

Atmospheric Pressure Plasma-Enhanced CVD for Surface Modification: Principles and Applications

Abstract:

This review gives an overview of the characteristics of various non-thermal, nonequilibrium plasmas and outlines results of AP-PECVD with dielectric barrier discharges.

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Periodical:

Advances in Science and Technology (Volume 45)

Pages:

1173-1177

DOI:

https://doi.org/10.4028/www.scientific.net/AST.45.1173

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Online since:

October 2006

Authors:

Michael L. Hitchman, Sergei E. Alexandrov

Keywords:

Atmospheric Pressure PECVD, Dielectric Barrier Discharge, Silicon Oxide (SiO), Surface Modification

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