MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films

Raffaella Lo Nigro; Roberta G. Toro; Graziella Malandrino; Ignazio L. Fragalà

doi:10.4028/www.scientific.net/AST.45.1194

Paper Titles

Suspension Plasma Spraying: From Injection to Coating
p.1163

Atmospheric Pressure Plasma-Enhanced CVD for Surface Modification: Principles and Applications
p.1173

Grain-Focused Microstructure Simulations: Stress-Induced Evolution of Polycrystalline Films
p.1178

Low Temperature MOCVD-Processed Alumina Coatings
p.1184

MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu₃Ti₄O₁₂) Thin Films
p.1194

Sintering of EPD Ceramic Coatings by Electron Beam
p.1200

Morphological and Structural Characterization of TiN/ZrN Superlattices Deposited by Reactive R.F. Magnetron Sputtering
p.1206

Structure and Electromechanical Properties of Quenched PMN-PT Single Crystal Thin Films
p.1212

Coating of Austentic Stainless Steel with Ti/O Compositionally Gradient Film by Reactive DC Sputtering
p.1218

HomeAdvances in Science and TechnologyAdvances in Science and Technology Vol. 45MOCVD Route to the Fabrication of Calcium Copper...

MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu₃Ti₄O₁₂) Thin Films

Abstract:

CaCu3Ti4O12 (CCTO) thin films have been successfully deposited by Metal Organic Chemical Vapor Deposition (MOCVD) technique. A novel approach based on a molten multicomponent precursor source has been applied. The molten mixture consists of the Ca(hfa)2•tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4- pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5- heptandione; O-iPr= iso-propoxide] precursors. Film complete structural and morphological characterizations have been carried out using several techniques [X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM)].

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advances in Science and Technology (Volume 45)

Pages:

1194-1199

DOI:

https://doi.org/10.4028/www.scientific.net/AST.45.1194

Citation:

Cite this paper

Online since:

October 2006

Authors:

Raffaella Lo Nigro, Roberta G. Toro, Graziella Malandrino, Ignazio L. Fragalà

Keywords:

Calcium Copper Titanate, MOCVD Process, Thin Film

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] M. A. Subramanian, D. Li, N. Duan, B. A. Reisner and A. W. Sleight: J. Solid State Chem. 151 (2000) p.323.

Google Scholar

[2] A. P. Ramirez, M. A. Subramanian, M. Gradel, G. Blumberg, D. Li, T. Vogt and S. M. Shapiro: Solid State Commun. 115 (2000) p.217.

Google Scholar

[3] C. C. Homes, T. Vogt, S. M. Shapiro, S. Wakimoto and A. P. Ramirez: Science 293 (2001) p.673.

Google Scholar

[4] Y. J. Kim, S. Wakimoto, S. M. Shapiro, P. M. Gehring and A. P. Ramirez: Solid State Commun. 121 (2002) p.625.

Google Scholar

[5] S. M. Moussa and B. Kennedy: J. Mater. Res. Bull 36 (2001) p.2525.

Google Scholar

[6] N. Kolev, R. P. Bontchev, A. J. Jacobson, V. N. Popov, V. G. Hadjiev, A. P. Litvinchuck and M. N. Iliev: Phys. Rev. B 66 (2002) p.132102.

Google Scholar

[7] C. C. Homes, T. Vogt, S. M. Shapiro, S. Wakimoto, M. A. Subramanian and A. P. Ramirez: Phys. Rev. B 67 (2003) p.092106.

Google Scholar

[8] D.P. Cann, S. Aygun and X. Tan: Extended Abstracts of the 11th USJapan Seminar on Dielectric and Piezoelectric Ceramics, Sapporo Japan, 2003, pp.153-156.

Google Scholar

[9] Y. Lin, Y.B. Chen, T. Garret, S.W. Liu, C.L. Chen, L. Chen, R.P. Bontchev, A. Jacobson, J.C. Jiang, E.I. Meletis, J. Horwitz and H. -D. Wu: Appl. Phys. Lett. 81 (2002) p.631.

DOI: 10.1063/1.1490624

Google Scholar

[10] L. Chen, C.L. Chen, Y. Lin, Y.B. Chen, X.H. Chen, R.P. Bontchev, C.Y. Park and A.J. Jacobson: Appl. Phys. Lett. 82 (2003) p.2317.

Google Scholar

[11] W. Si, E.M. Cruz, P.D. Johnson, P.W. Barnes, P. Woodward and A. P. Ramirez: Appl. Phys. Lett. 81 (2002) p. (2056).

Google Scholar

[12] R. Lo Nigro, R. Toro, G. Malandrino, M. Bettinelli, A. Speghini and I. L. Fragalà: Adv. Mater. 16 (2004) p.891.

DOI: 10.1002/adma.200306634

Google Scholar

[13] R. Lo Nigro, G. Malandrino, R. G. Toro, M. Losurdo, G. Bruno and I. L. Fragalà: J. Am. Chem- Soc. 127 (2005) p.13772.

DOI: 10.1021/ja0541229

Google Scholar

[14] G. Malandrino, F. Castelli and I. L. Fragalà: Inorg. Chim. Acta, 224 (1994) p.203.

Google Scholar