MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films

Abstract:

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CaCu3Ti4O12 (CCTO) thin films have been successfully deposited by Metal Organic Chemical Vapor Deposition (MOCVD) technique. A novel approach based on a molten multicomponent precursor source has been applied. The molten mixture consists of the Ca(hfa)2•tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4- pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5- heptandione; O-iPr= iso-propoxide] precursors. Film complete structural and morphological characterizations have been carried out using several techniques [X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM)].

Info:

Periodical:

Edited by:

P. VINCENZINI

Pages:

1194-1199

DOI:

10.4028/www.scientific.net/AST.45.1194

Citation:

R. Lo Nigro et al., "MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films ", Advances in Science and Technology, Vol. 45, pp. 1194-1199, 2006

Online since:

October 2006

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Price:

$35.00

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