Point Defect Behaviour Resulting from Dopant Diffusions in Silicon

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Periodical:

Defect and Diffusion Forum (Volumes 148-149)

Edited by:

David J. Fisher

Pages:

48-102

DOI:

10.4028/www.scientific.net/DDF.148-149.48

Citation:

T. Okino "Point Defect Behaviour Resulting from Dopant Diffusions in Silicon", Defect and Diffusion Forum, Vols. 148-149, pp. 48-102, 1997

Online since:

March 1997

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$35.00

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