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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 194-199Enhanced Diffusion Following Point Defect...

Enhanced Diffusion Following Point Defect Injection into B in SiGe and Si

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Diffusion in Materials DIMAT2000

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Pages:

717-722

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.194-199.717

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Online since:

April 2001

Authors:

Arthur F.W. Willoughby, Janet M. Bonar, Aihua Dan, Barry M. McGregor

Keywords:

Boron, Diffusion, Diffusion Mechanism, Enhanced Diffusion, Point Defect Injection, Silicon, Silicon-Germanium (SiGe)

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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