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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 194-199Boron Diffusion in Strained and Relaxed Si1-xGex

Boron Diffusion in Strained and Relaxed Si_1-xGe_x

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Diffusion in Materials DIMAT2000

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Pages:

703-708

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.194-199.703

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Online since:

April 2001

Authors:

N.R. Zangenberg, J. Fage-Pedersen, J. Lundsgaard Hansen, Arne Nylandsted-Larsen

Keywords:

Boron, Diffusion, Silicon, Silicon-Germanium (SiGe), Strain

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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