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Paper Titles
Deep Level Characterization and its Passivation in 3C-SiC Monitored by Capacitance Transient Methods
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The Formation of p-Type ZnO Films by Using a Diffusion Process
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The Role of Dislocations in the Plastic Behavior of Silicon Nitride A Review
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Structural Defects in Amorphous Silicon Oxynitride and Silicon Nitride
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Sintering Characteristics of Nano-Ceramic Coatings
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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 218-220The Formation of p-Type ZnO Films by Using a...

The Formation of p-Type ZnO Films by Using a Diffusion Process

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Periodical:

Defect and Diffusion Forum (Volumes 218-220)

Pages:

17-22

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.218-220.17

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Online since:

August 2003

Authors:

Min Chang Jeong, D.K. Hwang, Jae Min Myoung, Y.D. Ko, M.S. Kim, I. Yun

Keywords:

Diffusion, Homojunction, RF Magnetron Sputtering, Zinc Oxide (ZnO)

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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