Chemical Diffusion in TiO2

Abstract:

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Chemical diffusion in TiO2-x within n - p transition regime has been studied. In this regime several point defects such as oxygen vacancies, • • O V , titanium interstitials, • • • i Ti and • • • • i Ti , electrons, ' e , and electron holes • h are present with comparable concentrations. Based on defect structure in TiO2-x the relationship between chemical diffusion coefficient and self-diffusion coefficients of both titanium and oxygen were deduced.

Info:

Periodical:

Defect and Diffusion Forum (Volumes 237-240)

Edited by:

M. Danielewski, R. Filipek, R. Kozubski, W. Kucza, P. Zieba, Z. Zurek

Pages:

468-473

DOI:

10.4028/www.scientific.net/DDF.237-240.468

Citation:

M. Radecka and M. Rekas, "Chemical Diffusion in TiO2 ", Defect and Diffusion Forum, Vols. 237-240, pp. 468-473, 2005

Online since:

April 2005

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$35.00

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