Chemical Diffusion in TiO2
Chemical diffusion in TiO2-x within n - p transition regime has been studied. In this regime several point defects such as oxygen vacancies, • • O V , titanium interstitials, • • • i Ti and • • • • i Ti , electrons, ' e , and electron holes • h are present with comparable concentrations. Based on defect structure in TiO2-x the relationship between chemical diffusion coefficient and self-diffusion coefficients of both titanium and oxygen were deduced.
M. Danielewski, R. Filipek, R. Kozubski, W. Kucza, P. Zieba, Z. Zurek
M. Radecka and M. Rekas, "Chemical Diffusion in TiO2 ", Defect and Diffusion Forum, Vols. 237-240, pp. 468-473, 2005