Chemical Diffusion in TiO2

M. Radecka; M. Rekas

doi:10.4028/www.scientific.net/DDF.237-240.468

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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 237-240Chemical Diffusion in TiO2

Chemical Diffusion in TiO₂

Abstract:

Chemical diffusion in TiO2-x within n - p transition regime has been studied. In this regime several point defects such as oxygen vacancies, • • O V , titanium interstitials, • • • i Ti and • • • • i Ti , electrons, ' e , and electron holes • h are present with comparable concentrations. Based on defect structure in TiO2-x the relationship between chemical diffusion coefficient and self-diffusion coefficients of both titanium and oxygen were deduced.

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Periodical:

Defect and Diffusion Forum (Volumes 237-240)

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468-473

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.237-240.468

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Online since:

April 2005

Authors:

M. Radecka, M. Rekas

Keywords:

Chemical Diffusion, Defect Structure, Electrical Conductivity, Rutile, TiO₂

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