Influence of Co-Implantation on Diffusion
a.580
a.580
Influence of Concentration Dependences of Diffusion upon Dopant Dynamics
a.581
a.581
Measuring the Continuity of Diffusion Barriers on Porous Films
a.582
a.582
Numerical Computation of Surface Diffusion
a.583
a.583
Photo-Induced Cation Interstitial Diffusion in II–VI Semiconductors
a.584
a.584
Quasielastic and Low Vibrational Lineshapes in Atom–Surface Diffusion
a.585
a.585
Surface Diffusion during Molecular-Beam Epitaxy of III-V Compounds
a.586
a.586
Three-Dimensional Steady-State Constant-Source Diffusion
a.587
a.587
Tuning Diffusion and Friction in Microscopic Contacts
a.588
a.588
Photo-Induced Cation Interstitial Diffusion in II–VI Semiconductors
Page: A584